Monatomic Ar+ Ion Source (Minibeam 4)

This ion source is designed to produce a stable, high current, monatomic Ar+ ion beam with energies from 0.5 to 4 keV.  High ion flux guarantees excellent sputter depth profiling etch rates.  The Minibeam 4 is ideally suited to sputter cleaning and depth profiling inorganic and metallic films.  It may also be used to generate low-energy He+ ions for use with ion scattering spectroscopy (ISS).

Minibeam 4: Monatomic Ar+ Ion Source - Kratos Analytical